ViennaPS 3.6.0__cp312-cp312-macosx_11_0_arm64.whl → 4.1.0__cp312-cp312-macosx_11_0_arm64.whl

viennaps/d3/gpu.pyi

@@ -0,0 +1,90 @@
+"""
+GPU accelerated functions.
+"""
+
+from __future__ import annotations
+import collections.abc
+import typing
+import viennaps._core
+import viennaps.d3
+
+__all__: list[str] = [
+    "FaradayCageEtching",
+    "HBrO2Etching",
+    "IonBeamEtching",
+    "MultiParticleProcess",
+    "ProcessModelGPU",
+    "SF6O2Etching",
+    "SingleParticleProcess",
+]
+
+class FaradayCageEtching(viennaps.d3.ProcessModel):
+    def __init__(
+        self,
+        parameters: viennaps._core.FaradayCageParameters,
+        maskMaterials: collections.abc.Sequence[viennaps._core.Material],
+    ) -> None: ...
+
+class HBrO2Etching(ProcessModelGPU):
+    def __init__(self, parameters: viennaps._core.PlasmaEtchingParameters) -> None: ...
+
+class IonBeamEtching(viennaps.d3.ProcessModel):
+    def __init__(
+        self,
+        parameters: viennaps._core.IBEParameters,
+        maskMaterials: collections.abc.Sequence[viennaps._core.Material],
+    ) -> None: ...
+
+class MultiParticleProcess(ProcessModelGPU):
+    def __init__(self) -> None: ...
+    def addIonParticle(
+        self,
+        sourcePower: typing.SupportsFloat,
+        thetaRMin: typing.SupportsFloat = 0.0,
+        thetaRMax: typing.SupportsFloat = 90.0,
+        minAngle: typing.SupportsFloat = 0.0,
+        B_sp: typing.SupportsFloat = -1.0,
+        meanEnergy: typing.SupportsFloat = 0.0,
+        sigmaEnergy: typing.SupportsFloat = 0.0,
+        thresholdEnergy: typing.SupportsFloat = 0.0,
+        inflectAngle: typing.SupportsFloat = 0.0,
+        n: typing.SupportsFloat = 1,
+        label: str = "ionFlux",
+    ) -> None: ...
+    @typing.overload
+    def addNeutralParticle(
+        self, stickingProbability: typing.SupportsFloat, label: str = "neutralFlux"
+    ) -> None: ...
+    @typing.overload
+    def addNeutralParticle(
+        self,
+        materialSticking: collections.abc.Mapping[
+            viennaps._core.Material, typing.SupportsFloat
+        ],
+        defaultStickingProbability: typing.SupportsFloat = 1.0,
+        label: str = "neutralFlux",
+    ) -> None: ...
+    def setRateFunction(
+        self,
+        arg0: collections.abc.Callable[
+            [collections.abc.Sequence[typing.SupportsFloat], viennaps._core.Material],
+            float,
+        ],
+    ) -> None: ...
+
+class ProcessModelGPU(viennaps.d3.ProcessModelBase):
+    pass
+
+class SF6O2Etching(ProcessModelGPU):
+    def __init__(self, parameters: viennaps._core.PlasmaEtchingParameters) -> None: ...
+
+class SingleParticleProcess(ProcessModelGPU):
+    def __init__(
+        self,
+        materialRates: collections.abc.Mapping[
+            viennaps._core.Material, typing.SupportsFloat
+        ],
+        rate: typing.SupportsFloat,
+        stickingProbability: typing.SupportsFloat,
+        sourceExponent: typing.SupportsFloat,
+    ) -> None: ...

{viennaps-3.6.0.dist-info → viennaps-4.1.0.dist-info}/METADATA

@@ -1,13 +1,8 @@
 Metadata-Version: 2.2
 Name: ViennaPS
-Version: 3.6.0
-Summary: Semiconductor fabrication process simulation library
-License: Parts of the code (located in the 'external/' subfolder) have different
-         licenses. The individual licenses apply for this specific part. Please consult
-         the respective LICENSE files.
-         
-         
-         Copyright (c) 2015      Institute for Microelectronics, TU Wien.
+Version: 4.1.0
+Summary: Topography simulation library for microelectronic fabrication processes
+License: Copyright (c) 2025      Institute for Microelectronics, TU Wien.
          
          Permission is hereby granted, free of charge, to any person obtaining a copy
          of this software and associated documentation files (the "Software"), to deal
@@ -31,27 +26,28 @@ Project-URL: Homepage, https://viennatools.github.io/ViennaPS/
 Project-URL: Documentation, https://viennatools.github.io/ViennaPS/
 Project-URL: Repository, https://github.com/ViennaTools/ViennaPS
 Project-URL: Issues, https://github.com/ViennaTools/ViennaPS/issues
-Requires-Dist: ViennaLS>=4.4.0
+Requires-Dist: ViennaLS>=5.0.1
 Description-Content-Type: text/markdown
 
 <div align="center">
 
-![](assets/logo.png)
-
-<h1>ViennaPS - Process Simulation Library</h1>
+<picture>
+  <source srcset="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title-dark.png" media="(prefers-color-scheme: dark)">
+  <source srcset="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title.png" media="(prefers-color-scheme: light)">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title.png" alt="ViennaPS" width=500>
+</picture>
 
+---
+ 
 [![🐍 Build Bindings](https://github.com/ViennaTools/ViennaPS/actions/workflows/python.yml/badge.svg)](https://github.com/ViennaTools/ViennaPS/actions/workflows/python.yml)
 [![🧪 Run Tests](https://github.com/ViennaTools/ViennaPS/actions/workflows/build.yml/badge.svg)](https://github.com/ViennaTools/ViennaPS/actions/workflows/build.yml)
 [![PyPi Version](https://img.shields.io/pypi/v/ViennaPS?logo=pypi)](https://pypi.org/project/ViennaPS/)
 
 </div>
 
-ViennaPS is a header-only C++ library for simulating microelectronic fabrication processes. It combines surface and volume representations with advanced level-set methods and Monte Carlo flux calculations, powered by high-performance ray tracing. Users can develop custom models, use pre-configured physical models, or leverage emulation for flexible and efficient process simulations.
+ViennaPS is a header-only C++ library for topography simulation in microelectronic fabrication processes. It models the evolution of 2D and 3D surfaces during etching, deposition, and related steps, combining advanced level-set methods for surface evolution with Monte Carlo ray tracing for flux calculation. This allows accurate, feature-scale simulation of complex fabrication geometries.
 
-ViennaPS is designed to be easily integrated into existing C++ projects and provides Python bindings for seamless use in Python environments. The library is under active development and is continuously improved to meet the evolving needs of process simulation in microelectronics.
-
-> [!NOTE]  
-> ViennaPS is under heavy development and improved daily. If you do have suggestions or find bugs, please let us know!
+ViennaPS supports both physical process models and fast emulation approaches, enabling flexible and efficient development of semiconductor processes. It can be easily integrated into existing C++ projects and also provides Python bindings for use in Python-based workflows. The library is actively developed and continuously improved to address the needs of process and topography simulation in microelectronics.
 
 ## Quick Start  
 
@@ -66,6 +62,10 @@ To use ViennaPS in C++, clone the repository and follow the installation steps b
 For full documentation, visit [ViennaPS Documentation](https://viennatools.github.io/ViennaPS/).
 
 ## Releases
+
+> [!NOTE]  
+> ViennaPS is under heavy development and improved daily. If you do have suggestions or find bugs, please let us know!
+
 Releases are tagged on the master branch and available in the [releases section](https://github.com/ViennaTools/ViennaPS/releases).
 
 ViennaPS is also available on the [Python Package Index (PyPI)](https://pypi.org/project/ViennaPS/) for most platforms.  
@@ -97,7 +97,7 @@ ViennaPS is also available on the [Python Package Index (PyPI)](https://pypi.org
 
 * [ViennaCS](https://github.com/ViennaTools/viennacs)
 
-* [pybind11](https://github.com/pybind/pybind11) (2.12.0+, only for building Python libs)
+* [pybind11](https://github.com/pybind/pybind11) (3.0.0+, only for building Python libs)
 
 The CMake configuration automatically checks if the dependencies are installed.
 If the dependencies are not found on the system, they will be built from source. To use local installations of the dependencies, the `VIENNAPS_LOOKUP_DIRS` variable can be set to the installation path of the dependencies.
@@ -105,7 +105,7 @@ If the dependencies are not found on the system, they will be built from source.
 ## Installing
 
 > [!NOTE]  
-> __For more detailed installation instructions and troubleshooting tips, please refer to the ViennaPS [documentation](https://viennatools.github.io/ViennaPS/inst/).__
+> __For more detailed installation instructions and troubleshooting tips, have a look at the ViennaPS [documentation](https://viennatools.github.io/ViennaPS/inst/).__
 
 ViennaPS is a header-only library, so no formal installation is required. However, following the steps below helps organize and manage dependencies more effectively:
 
@@ -117,7 +117,7 @@ cmake -B build && cmake --build build
 cmake --install build --prefix "/path/to/your/custom/install/"
 ```
 
-This will install the necessary headers and CMake files to the specified path. If `--prefix` is not specified, it will be installed to the standard path for your system, usually `/usr/local/` . 
+This will install the necessary headers and CMake files to the specified path. If `--prefix` is not specified, it will be installed to the standard path for your system, usually `/usr/local/` on Linux-based systems.
 
 ## Building the Python package
 
@@ -130,28 +130,31 @@ cd ViennaPS
 pip install .
 ```
 
-> Some features of the ViennaPS Python module require the ViennaLS Python module. It is therefore recommended to additionally install the ViennaLS Python module on your system. Instructions to do so can be found in the [ViennaLS Git Repository](https://github.com/ViennaTools/viennals).
+> Some features of the ViennaPS Python module depend on the ViennaLS Python module. The ViennaLS is installed automatically as a dependency.
+> Note: A locally built ViennaPS Python module is typically not compatible with the ViennaLS package from PyPI. For details and troubleshooting, see [this guide](https://viennatools.github.io/ViennaPS/inst/troubleshooting.html#python-importerror).
 
 ## Using the Python package
 
-The 2D version of the library can be imported as follows:
+The ViennaPS Python package can be used by importing it in your Python scripts:
 ```python
-import viennaps2d as vps
+import viennaps as vps
 ```
 
-In order to switch to three dimensions, only the import needs to be changed:
-
+By default, ViennaPS operates in two dimensions. You can set the dimension using:
 ```python
-import viennaps3d as vps
+vps.setDimension(2)  # For 2D simulations
+vps.setDimension(3)  # For 3D simulations
 ```
 
+For more details and examples, refer to the official [documentation](https://viennatools.github.io/ViennaPS/).
+
 ## Integration in CMake projects
 
 We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consume this library.
 
 * Installation with CPM
   ```cmake
-  CPMAddPackage("gh:viennatools/viennaps@3.6.0")
+  CPMAddPackage("gh:viennatools/viennaps@4.0.1")
   ```
 
 * With a local installation
@@ -164,16 +167,25 @@ We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consum
     target_link_libraries(${PROJECT_NAME} PUBLIC ViennaTools::ViennaPS)
     ```
 
+### Shared Library
+
+In order to save build time during development, dynamically linked shared libraries can be used if ViennaPS was built with them. This is done by precompiling the most common template specialisations. In order to use shared libraries, use
+
+```bash
+cmake -B build -DVIENNALS_PRECOMPILE_HEADERS=ON
+```
+
+If ViennaPS was built with shared libraries and you use ViennaPS in your project (see above), CMake will automatically link them to your project.
+
 ## GPU Acceleration (Experimental)
 
-As of version 3.4.0, ViennaPS supports GPU acceleration for the ray tracing part of the library. This feature is still experimental and may not work on all systems. Details on how to enable GPU functionality can be found in the [documentation](https://viennatools.github.io/ViennaPS/inst/).
+As of version 3.4.0, ViennaPS supports GPU acceleration for the ray tracing part of the library. This feature is still experimental and may not work on all systems. Details on how to enable GPU functionality can be found in the [documentation](https://viennatools.github.io/ViennaPS/inst/gpu.html).
 
 ## Basic Examples
 
 ### Building
 
 The examples can be built using CMake:
-> __Important__: Make sure all dependencies are installed and have been built previously
 
 ```bash
 git clone https://github.com/ViennaTools/ViennaPS.git
@@ -185,7 +197,7 @@ cmake --build build
 
 The examples can then be executed in their respective build folders with the config files, e.g.:
 ```bash
-cd examples/exampleName
+cd build/examples/exampleName
 ./exampleName.bat config.txt # (Windows)
 ./exampleName config.txt # (Other)
 ```
@@ -197,12 +209,12 @@ Individual examples can also be build by calling `make` in their respective buil
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/trenchDeposition) focuses on a particle deposition process within a trench geometry. By default, the simulation presents a 2D representation of the trench. Nevertheless, users have the flexibility to conduct 3D simulations by adjusting the value of the constant _D_ in __trenchDeposition.cpp__ to 3. Customization of process and geometry parameters is achieved through the __config.txt__ file. The accompanying image illustrates instances of the trench deposition process, showcasing variations in the particle sticking probability _s_.
 
 <div align="center">
-  <img src="assets/deposition.svg" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/deposition.png" width=700 style="background-color:white;">
 </div>
 
-### SF<sub>6</sub>O<sub>2</sub> Hole Etching
+### SF<sub>6</sub>/O<sub>2</sub> Hole Etching
 
-This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/holeEtching) demonstrates a hole etching process with a SF<sub>6</sub>O<sub>2</sub> plasma etching chemistry with ion bombardment. The process is controlled by various parameters, including geometry and plasma conditions, which can be adjusted in the __config.txt__ file.
+This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/holeEtching) demonstrates a hole etching process with a SF<sub>6</sub>/O<sub>2</sub> plasma etching chemistry with ion bombardment. The process is controlled by various parameters, including geometry and plasma conditions, which can be adjusted in the __config.txt__ file.
 
 The image presents the results of different flux configurations, as tested in _testFluxes.py_. Each structure represents a variation in flux conditions, leading to differences in hole shape, depth, and profile characteristics. The variations highlight the influence of ion and neutral fluxes on the etching process.
 
@@ -211,7 +223,7 @@ The image presents the results of different flux configurations, as tested in _t
 > The images shown here were generated using **ViennaPS v3.6.0**.
 
 <div align="center">
-  <img src="assets/sf6o2_results.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/sf6o2_results.png" width=700 style="background-color:white;">
 </div>
 
 ### Bosch Process
@@ -225,16 +237,23 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/bosc
 This comparison highlights the trade-offs between computational efficiency and physical accuracy in DRIE simulations.
 
 <div align="center">
-  <img src="assets/bosch_process.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/bosch_process.png" width=700 style="background-color:white;">
 </div>
 
+### Wet Etching
 
-### Anisotropic Processes
+This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cantileverWetEtching) demonstrates the wet etching process, specifically focusing on the cantilever structure. The simulation captures the etching dynamics and the influence of crystallographic directions on the etch profile.
 
-In the anisotropic process model, the etch or deposition rates are dependent on the crystallographic directions of the surface. This enables the accurate modeling of intricate processes like [epitaxial growth](https://github.com/ViennaTools/ViennaPS/tree/master/examples/selectiveEpitaxy) or [anisotropic wet etching](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cantileverWetEtching). Basic examples, illustrating these processes are provided with the library and shown below.
+<div align="center">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/wet_etching.png" width=700 style="background-color:white;">
+</div>
+
+### Selective Epitaxy
+
+This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/selectiveEpitaxy) demonstrates the selective epitaxy process, focusing on the growth of SiGe on a Si substrate. Similar to wet etching, the process is influenced by crystallographic directions, which can be adjusted in the __config.txt__ file. The simulation captures the growth dynamics and the resulting SiGe structure.
 
 <div align="center">
-  <img src="assets/anisotropic_process.svg" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/epitaxy.png" width=700 style="background-color:white;">
 </div>
 
 ### Redeposition During Selective Etching
@@ -242,7 +261,7 @@ In the anisotropic process model, the etch or deposition rates are dependent on
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/oxideRegrowth) demonstrates capturing etching byproducts and the subsequent redeposition during a selective etching process in a Si<sub>3</sub>N<sub>4</sub>/SiO<sub>2</sub> stack. The etching byproducts are captured in a cell set description of the etching plasma. To model the dynamics of these etching byproducts, a convection-diffusion equation is solved on the cell set using finite differences. The redeposition is then captured by adding up the byproducts in every step and using this information to generate a velocity field on the etched surface. 
 
 <div align="center">
-  <img src="assets/redeposition.gif" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/redeposition.gif" width=700 style="background-color:white;">
 </div>
 
 ### GDS Mask Import Example
@@ -250,7 +269,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/oxid
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/GDSReader) tests the full GDS mask import, blurring, rotation, scaling, and flipping as well as the level set conversion pipeline. Shown below is the result after applying proximity correction and extrusion on a simple test.
 
 <div align="center">
-  <img src="assets/masks.png" width=1200 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/masks.png" width=1200 style="background-color:white;">
 </div>
 
 
@@ -287,6 +306,9 @@ Contact us via: viennatools@iue.tuwien.ac.at
 ViennaPS was developed under the aegis of the 'Institute for Microelectronics' at the 'TU Wien'.
 http://www.iue.tuwien.ac.at/
 
-License
---------------------------
-See file LICENSE in the base directory.
+## License
+
+ViennaPS is licensed under the [MIT License](./LICENSE).
+
+Some third-party libraries used by ViennaPS are under their own permissive licenses (MIT, BSD, Apache-2.0).  
+See [`THIRD_PARTY_LICENSES.md`](./THIRD_PARTY_LICENSES.md) for details.