ViennaPS 3.7.0__cp312-cp312-win_amd64.whl → 3.7.2__cp312-cp312-win_amd64.whl

{viennaps-3.7.0.dist-info → viennaps-3.7.2.dist-info}/METADATA

@@ -1,7 +1,7 @@
 Metadata-Version: 2.2
 Name: ViennaPS
-Version: 3.7.0
-Summary: Semiconductor fabrication process simulation library
+Version: 3.7.2
+Summary: Topography simulation library for microelectronic fabrication processes
 License: Copyright (c) 2025      Institute for Microelectronics, TU Wien.
          
          Permission is hereby granted, free of charge, to any person obtaining a copy
@@ -31,19 +31,23 @@ Description-Content-Type: text/markdown
 
 <div align="center">
 
-![](assets/logo.png)
-
-<h1>ViennaPS - Process Simulation Library</h1>
+<picture>
+  <source srcset="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title-dark.png" media="(prefers-color-scheme: dark)">
+  <source srcset="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title.png" media="(prefers-color-scheme: light)">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title.png" alt="ViennaPS" width=500>
+</picture>
 
+---
+ 
 [![🐍 Build Bindings](https://github.com/ViennaTools/ViennaPS/actions/workflows/python.yml/badge.svg)](https://github.com/ViennaTools/ViennaPS/actions/workflows/python.yml)
 [![🧪 Run Tests](https://github.com/ViennaTools/ViennaPS/actions/workflows/build.yml/badge.svg)](https://github.com/ViennaTools/ViennaPS/actions/workflows/build.yml)
 [![PyPi Version](https://img.shields.io/pypi/v/ViennaPS?logo=pypi)](https://pypi.org/project/ViennaPS/)
 
 </div>
 
-ViennaPS is a header-only C++ library for simulating microelectronic fabrication processes. It combines surface and volume representations with advanced level-set methods and Monte Carlo flux calculations, powered by high-performance ray tracing. Users can develop custom models, use pre-configured physical models, or use fast emulation models for flexible and efficient process development.
+ViennaPS is a header-only C++ library for topography simulation in microelectronic fabrication processes. It models the evolution of 2D and 3D surfaces during etching, deposition, and related steps, combining advanced level-set methods for surface evolution with Monte Carlo ray tracing for flux calculation. This allows accurate, feature-scale simulation of complex fabrication geometries.
 
-ViennaPS is designed to be easily integrated into existing C++ projects and provides Python bindings for seamless use in Python environments. The library is under active development and is continuously improved to meet the evolving needs of process simulation in microelectronics.
+ViennaPS supports both physical process models and fast emulation approaches, enabling flexible and efficient development of semiconductor processes. It can be easily integrated into existing C++ projects and also provides Python bindings for use in Python-based workflows. The library is actively developed and continuously improved to address the needs of process and topography simulation in microelectronics.
 
 ## Quick Start  
 
@@ -93,7 +97,7 @@ ViennaPS is also available on the [Python Package Index (PyPI)](https://pypi.org
 
 * [ViennaCS](https://github.com/ViennaTools/viennacs)
 
-* [pybind11](https://github.com/pybind/pybind11) (2.12.0+, only for building Python libs)
+* [pybind11](https://github.com/pybind/pybind11) (3.0.0+, only for building Python libs)
 
 The CMake configuration automatically checks if the dependencies are installed.
 If the dependencies are not found on the system, they will be built from source. To use local installations of the dependencies, the `VIENNAPS_LOOKUP_DIRS` variable can be set to the installation path of the dependencies.
@@ -101,7 +105,7 @@ If the dependencies are not found on the system, they will be built from source.
 ## Installing
 
 > [!NOTE]  
-> __For more detailed installation instructions and troubleshooting tips, please refer to the ViennaPS [documentation](https://viennatools.github.io/ViennaPS/inst/).__
+> __For more detailed installation instructions and troubleshooting tips, have a look at the ViennaPS [documentation](https://viennatools.github.io/ViennaPS/inst/).__
 
 ViennaPS is a header-only library, so no formal installation is required. However, following the steps below helps organize and manage dependencies more effectively:
 
@@ -148,7 +152,7 @@ We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consum
 
 * Installation with CPM
   ```cmake
-  CPMAddPackage("gh:viennatools/viennaps@3.7.0")
+  CPMAddPackage("gh:viennatools/viennaps@3.7.2")
   ```
 
 * With a local installation
@@ -161,6 +165,16 @@ We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consum
     target_link_libraries(${PROJECT_NAME} PUBLIC ViennaTools::ViennaPS)
     ```
 
+### Shared Library
+
+In order to save build time during development, dynamically linked shared libraries can be used if ViennaPS was built with them. This is done by precompiling the most common template specialisations. In order to use shared libraries, use
+
+```bash
+cmake -B build -DVIENNALS_PRECOMPILE_HEADERS=ON
+```
+
+If ViennaPS was built with shared libraries and you use ViennaPS in your project (see above), CMake will automatically link them to your project.
+
 ## GPU Acceleration (Experimental)
 
 As of version 3.4.0, ViennaPS supports GPU acceleration for the ray tracing part of the library. This feature is still experimental and may not work on all systems. Details on how to enable GPU functionality can be found in the [documentation](https://viennatools.github.io/ViennaPS/inst/).
@@ -194,7 +208,7 @@ Individual examples can also be build by calling `make` in their respective buil
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/trenchDeposition) focuses on a particle deposition process within a trench geometry. By default, the simulation presents a 2D representation of the trench. Nevertheless, users have the flexibility to conduct 3D simulations by adjusting the value of the constant _D_ in __trenchDeposition.cpp__ to 3. Customization of process and geometry parameters is achieved through the __config.txt__ file. The accompanying image illustrates instances of the trench deposition process, showcasing variations in the particle sticking probability _s_.
 
 <div align="center">
-  <img src="assets/deposition.svg" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/deposition.png" width=700 style="background-color:white;">
 </div>
 
 ### SF<sub>6</sub>/O<sub>2</sub> Hole Etching
@@ -208,7 +222,7 @@ The image presents the results of different flux configurations, as tested in _t
 > The images shown here were generated using **ViennaPS v3.6.0**.
 
 <div align="center">
-  <img src="assets/sf6o2_results.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/sf6o2_results.png" width=700 style="background-color:white;">
 </div>
 
 ### Bosch Process
@@ -222,7 +236,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/bosc
 This comparison highlights the trade-offs between computational efficiency and physical accuracy in DRIE simulations.
 
 <div align="center">
-  <img src="assets/bosch_process.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/bosch_process.png" width=700 style="background-color:white;">
 </div>
 
 ### Wet Etching
@@ -230,7 +244,7 @@ This comparison highlights the trade-offs between computational efficiency and p
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cantileverWetEtching) demonstrates the wet etching process, specifically focusing on the cantilever structure. The simulation captures the etching dynamics and the influence of crystallographic directions on the etch profile.
 
 <div align="center">
-  <img src="assets/wet_etching.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/wet_etching.png" width=700 style="background-color:white;">
 </div>
 
 ### Selective Epitaxy
@@ -238,7 +252,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cant
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/selectiveEpitaxy) demonstrates the selective epitaxy process, focusing on the growth of SiGe on a Si substrate. Similar to wet etching, the process is influenced by crystallographic directions, which can be adjusted in the __config.txt__ file. The simulation captures the growth dynamics and the resulting SiGe structure.
 
 <div align="center">
-  <img src="assets/epitaxy.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/epitaxy.png" width=700 style="background-color:white;">
 </div>
 
 ### Redeposition During Selective Etching
@@ -246,7 +260,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/sele
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/oxideRegrowth) demonstrates capturing etching byproducts and the subsequent redeposition during a selective etching process in a Si<sub>3</sub>N<sub>4</sub>/SiO<sub>2</sub> stack. The etching byproducts are captured in a cell set description of the etching plasma. To model the dynamics of these etching byproducts, a convection-diffusion equation is solved on the cell set using finite differences. The redeposition is then captured by adding up the byproducts in every step and using this information to generate a velocity field on the etched surface. 
 
 <div align="center">
-  <img src="assets/redeposition.gif" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/redeposition.gif" width=700 style="background-color:white;">
 </div>
 
 ### GDS Mask Import Example
@@ -254,7 +268,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/oxid
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/GDSReader) tests the full GDS mask import, blurring, rotation, scaling, and flipping as well as the level set conversion pipeline. Shown below is the result after applying proximity correction and extrusion on a simple test.
 
 <div align="center">
-  <img src="assets/masks.png" width=1200 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/masks.png" width=1200 style="background-color:white;">
 </div>
 
 

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viennaps2d/__init__.pyi

@@ -1,6 +1,218 @@
-from .viennaps2d import *
-from _typeshed import Incomplete
+"""
 
-ptxPath: Incomplete
+ViennaPS
+========
 
-def ReadConfigFile(fileName: str): ...
+ViennaPS is a header-only C++ process simulation library,
+which includes surface and volume representations,
+a ray tracer, and physical models for the simulation of
+microelectronic fabrication processes.
+"""
+
+from __future__ import annotations
+import sys as sys
+import viennals2d as ls
+from viennals2d.viennals2d import BoundaryConditionEnum as BoundaryType
+from viennals2d.viennals2d import IntegrationSchemeEnum as IntegrationScheme
+from viennaps2d.viennaps2d import AdvectionCallback
+from viennaps2d.viennaps2d import AdvectionParameters
+from viennaps2d.viennaps2d import AtomicLayerProcess
+from viennaps2d.viennaps2d import BoxDistribution
+from viennaps2d.viennaps2d import CF4O2Etching
+from viennaps2d.viennaps2d import CF4O2Parameters
+from viennaps2d.viennaps2d import CF4O2ParametersIons
+from viennaps2d.viennaps2d import CF4O2ParametersMask
+from viennaps2d.viennaps2d import CF4O2ParametersPassivation
+from viennaps2d.viennaps2d import CF4O2ParametersSi
+from viennaps2d.viennaps2d import CF4O2ParametersSiGe
+from viennaps2d.viennaps2d import CSVFileProcess
+from viennaps2d.viennaps2d import DenseCellSet
+from viennaps2d.viennaps2d import DirectionalProcess
+from viennaps2d.viennaps2d import Domain
+from viennaps2d.viennaps2d import Domain3D
+from viennaps2d.viennaps2d import DomainSetup
+from viennaps2d.viennaps2d import Extrude
+from viennaps2d.viennaps2d import FaradayCageEtching
+from viennaps2d.viennaps2d import FaradayCageParameters
+from viennaps2d.viennaps2d import FluorocarbonEtching
+from viennaps2d.viennaps2d import FluorocarbonParameters
+from viennaps2d.viennaps2d import FluorocarbonParametersIons
+from viennaps2d.viennaps2d import FluorocarbonParametersMask
+from viennaps2d.viennaps2d import FluorocarbonParametersPolymer
+from viennaps2d.viennaps2d import FluorocarbonParametersSi
+from viennaps2d.viennaps2d import FluorocarbonParametersSi3N4
+from viennaps2d.viennaps2d import FluorocarbonParametersSiO2
+from viennaps2d.viennaps2d import GDSGeometry
+from viennaps2d.viennaps2d import GDSReader
+from viennaps2d.viennaps2d import GeometryFactory
+from viennaps2d.viennaps2d import HBrO2Etching
+from viennaps2d.viennaps2d import HoleShape
+from viennaps2d.viennaps2d import IBEParameters
+from viennaps2d.viennaps2d import Interpolation
+from viennaps2d.viennaps2d import IonBeamEtching
+from viennaps2d.viennaps2d import IsotropicProcess
+from viennaps2d.viennaps2d import Length
+from viennaps2d.viennaps2d import LengthUnit
+from viennaps2d.viennaps2d import LogLevel
+from viennaps2d.viennaps2d import Logger
+from viennaps2d.viennaps2d import MakeFin
+from viennaps2d.viennaps2d import MakeHole
+from viennaps2d.viennaps2d import MakePlane
+from viennaps2d.viennaps2d import MakeStack
+from viennaps2d.viennaps2d import MakeTrench
+from viennaps2d.viennaps2d import Material
+from viennaps2d.viennaps2d import MaterialMap
+from viennaps2d.viennaps2d import MetaDataLevel
+from viennaps2d.viennaps2d import MultiParticleProcess
+from viennaps2d.viennaps2d import NormalizationType
+from viennaps2d.viennaps2d import OxideRegrowth
+from viennaps2d.viennaps2d import Planarize
+from viennaps2d.viennaps2d import PlasmaEtchingParameters
+from viennaps2d.viennaps2d import PlasmaEtchingParametersIons
+from viennaps2d.viennaps2d import PlasmaEtchingParametersMask
+from viennaps2d.viennaps2d import PlasmaEtchingParametersPassivation
+from viennaps2d.viennaps2d import PlasmaEtchingParametersPolymer
+from viennaps2d.viennaps2d import PlasmaEtchingParametersSubstrate
+from viennaps2d.viennaps2d import Process
+from viennaps2d.viennaps2d import ProcessModel
+from viennaps2d.viennaps2d import ProcessParams
+from viennaps2d.viennaps2d import RateGrid
+from viennaps2d.viennaps2d import RateSet
+from viennaps2d.viennaps2d import RayTracingParameters
+from viennaps2d.viennaps2d import Reader
+from viennaps2d.viennaps2d import SF6C4F8Etching
+from viennaps2d.viennaps2d import SF6O2Etching
+from viennaps2d.viennaps2d import SelectiveEpitaxy
+from viennaps2d.viennaps2d import SingleParticleALD
+from viennaps2d.viennaps2d import SingleParticleProcess
+from viennaps2d.viennaps2d import SphereDistribution
+from viennaps2d.viennaps2d import StencilLocalLaxFriedrichsScalar
+from viennaps2d.viennaps2d import TEOSDeposition
+from viennaps2d.viennaps2d import TEOSPECVD
+from viennaps2d.viennaps2d import Time
+from viennaps2d.viennaps2d import TimeUnit
+from viennaps2d.viennaps2d import ToDiskMesh
+from viennaps2d.viennaps2d import WetEtching
+from viennaps2d.viennaps2d import Writer
+from viennaps2d.viennaps2d import constants
+from viennaps2d.viennaps2d import ray
+from viennaps2d.viennaps2d import setNumThreads
+from viennaps2d.viennaps2d import util
+from . import viennaps2d
+
+__all__: list[str] = [
+    "AdvectionCallback",
+    "AdvectionParameters",
+    "AtomicLayerProcess",
+    "BoundaryType",
+    "BoxDistribution",
+    "CF4O2Etching",
+    "CF4O2Parameters",
+    "CF4O2ParametersIons",
+    "CF4O2ParametersMask",
+    "CF4O2ParametersPassivation",
+    "CF4O2ParametersSi",
+    "CF4O2ParametersSiGe",
+    "CSVFileProcess",
+    "D",
+    "DenseCellSet",
+    "DirectionalProcess",
+    "Domain",
+    "Domain3D",
+    "DomainSetup",
+    "Extrude",
+    "FaradayCageEtching",
+    "FaradayCageParameters",
+    "FluorocarbonEtching",
+    "FluorocarbonParameters",
+    "FluorocarbonParametersIons",
+    "FluorocarbonParametersMask",
+    "FluorocarbonParametersPolymer",
+    "FluorocarbonParametersSi",
+    "FluorocarbonParametersSi3N4",
+    "FluorocarbonParametersSiO2",
+    "GDSGeometry",
+    "GDSReader",
+    "GeometryFactory",
+    "HBrO2Etching",
+    "HoleShape",
+    "IBEParameters",
+    "IntegrationScheme",
+    "Interpolation",
+    "IonBeamEtching",
+    "IsotropicProcess",
+    "Length",
+    "LengthUnit",
+    "LogLevel",
+    "Logger",
+    "MakeFin",
+    "MakeHole",
+    "MakePlane",
+    "MakeStack",
+    "MakeTrench",
+    "Material",
+    "MaterialMap",
+    "MetaDataLevel",
+    "MultiParticleProcess",
+    "NormalizationType",
+    "OxideRegrowth",
+    "Planarize",
+    "PlasmaEtchingParameters",
+    "PlasmaEtchingParametersIons",
+    "PlasmaEtchingParametersMask",
+    "PlasmaEtchingParametersPassivation",
+    "PlasmaEtchingParametersPolymer",
+    "PlasmaEtchingParametersSubstrate",
+    "Process",
+    "ProcessModel",
+    "ProcessParams",
+    "RateGrid",
+    "RateSet",
+    "RayTracingParameters",
+    "ReadConfigFile",
+    "Reader",
+    "SF6C4F8Etching",
+    "SF6O2Etching",
+    "SelectiveEpitaxy",
+    "SingleParticleALD",
+    "SingleParticleProcess",
+    "SphereDistribution",
+    "StencilLocalLaxFriedrichsScalar",
+    "TEOSDeposition",
+    "TEOSPECVD",
+    "Time",
+    "TimeUnit",
+    "ToDiskMesh",
+    "WetEtching",
+    "Writer",
+    "constants",
+    "ls",
+    "ray",
+    "setNumThreads",
+    "sys",
+    "util",
+    "version",
+    "viennaps2d",
+]
+
+def ReadConfigFile(fileName: str):
+    """
+    Read a config file in the ViennaPS standard config file format.
+
+        Parameters
+        ----------
+        fileName: str
+                    Name of the config file.
+
+        Returns
+        -------
+        dict
+            A dictionary containing the parameters from the config file.
+
+    """
+
+def _module_ptx_path(): ...
+def _windows_dll_path(): ...
+
+D: int = 2
+version: str = '"3.7.2"'