ViennaPS 3.7.0__cp311-cp311-musllinux_1_1_x86_64.whl → 3.7.2__cp311-cp311-musllinux_1_1_x86_64.whl

{viennaps-3.7.0.dist-info → viennaps-3.7.2.dist-info}/METADATA

@@ -1,7 +1,7 @@
 Metadata-Version: 2.2
 Name: ViennaPS
-Version: 3.7.0
-Summary: Semiconductor fabrication process simulation library
+Version: 3.7.2
+Summary: Topography simulation library for microelectronic fabrication processes
 License: Copyright (c) 2025      Institute for Microelectronics, TU Wien.
          
          Permission is hereby granted, free of charge, to any person obtaining a copy
@@ -31,19 +31,23 @@ Description-Content-Type: text/markdown
 
 <div align="center">
 
-![](assets/logo.png)
-
-<h1>ViennaPS - Process Simulation Library</h1>
+<picture>
+  <source srcset="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title-dark.png" media="(prefers-color-scheme: dark)">
+  <source srcset="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title.png" media="(prefers-color-scheme: light)">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/ViennaPS_title.png" alt="ViennaPS" width=500>
+</picture>
 
+---
+ 
 [![🐍 Build Bindings](https://github.com/ViennaTools/ViennaPS/actions/workflows/python.yml/badge.svg)](https://github.com/ViennaTools/ViennaPS/actions/workflows/python.yml)
 [![🧪 Run Tests](https://github.com/ViennaTools/ViennaPS/actions/workflows/build.yml/badge.svg)](https://github.com/ViennaTools/ViennaPS/actions/workflows/build.yml)
 [![PyPi Version](https://img.shields.io/pypi/v/ViennaPS?logo=pypi)](https://pypi.org/project/ViennaPS/)
 
 </div>
 
-ViennaPS is a header-only C++ library for simulating microelectronic fabrication processes. It combines surface and volume representations with advanced level-set methods and Monte Carlo flux calculations, powered by high-performance ray tracing. Users can develop custom models, use pre-configured physical models, or use fast emulation models for flexible and efficient process development.
+ViennaPS is a header-only C++ library for topography simulation in microelectronic fabrication processes. It models the evolution of 2D and 3D surfaces during etching, deposition, and related steps, combining advanced level-set methods for surface evolution with Monte Carlo ray tracing for flux calculation. This allows accurate, feature-scale simulation of complex fabrication geometries.
 
-ViennaPS is designed to be easily integrated into existing C++ projects and provides Python bindings for seamless use in Python environments. The library is under active development and is continuously improved to meet the evolving needs of process simulation in microelectronics.
+ViennaPS supports both physical process models and fast emulation approaches, enabling flexible and efficient development of semiconductor processes. It can be easily integrated into existing C++ projects and also provides Python bindings for use in Python-based workflows. The library is actively developed and continuously improved to address the needs of process and topography simulation in microelectronics.
 
 ## Quick Start  
 
@@ -93,7 +97,7 @@ ViennaPS is also available on the [Python Package Index (PyPI)](https://pypi.org
 
 * [ViennaCS](https://github.com/ViennaTools/viennacs)
 
-* [pybind11](https://github.com/pybind/pybind11) (2.12.0+, only for building Python libs)
+* [pybind11](https://github.com/pybind/pybind11) (3.0.0+, only for building Python libs)
 
 The CMake configuration automatically checks if the dependencies are installed.
 If the dependencies are not found on the system, they will be built from source. To use local installations of the dependencies, the `VIENNAPS_LOOKUP_DIRS` variable can be set to the installation path of the dependencies.
@@ -101,7 +105,7 @@ If the dependencies are not found on the system, they will be built from source.
 ## Installing
 
 > [!NOTE]  
-> __For more detailed installation instructions and troubleshooting tips, please refer to the ViennaPS [documentation](https://viennatools.github.io/ViennaPS/inst/).__
+> __For more detailed installation instructions and troubleshooting tips, have a look at the ViennaPS [documentation](https://viennatools.github.io/ViennaPS/inst/).__
 
 ViennaPS is a header-only library, so no formal installation is required. However, following the steps below helps organize and manage dependencies more effectively:
 
@@ -148,7 +152,7 @@ We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consum
 
 * Installation with CPM
   ```cmake
-  CPMAddPackage("gh:viennatools/viennaps@3.7.0")
+  CPMAddPackage("gh:viennatools/viennaps@3.7.2")
   ```
 
 * With a local installation
@@ -161,6 +165,16 @@ We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consum
     target_link_libraries(${PROJECT_NAME} PUBLIC ViennaTools::ViennaPS)
     ```
 
+### Shared Library
+
+In order to save build time during development, dynamically linked shared libraries can be used if ViennaPS was built with them. This is done by precompiling the most common template specialisations. In order to use shared libraries, use
+
+```bash
+cmake -B build -DVIENNALS_PRECOMPILE_HEADERS=ON
+```
+
+If ViennaPS was built with shared libraries and you use ViennaPS in your project (see above), CMake will automatically link them to your project.
+
 ## GPU Acceleration (Experimental)
 
 As of version 3.4.0, ViennaPS supports GPU acceleration for the ray tracing part of the library. This feature is still experimental and may not work on all systems. Details on how to enable GPU functionality can be found in the [documentation](https://viennatools.github.io/ViennaPS/inst/).
@@ -194,7 +208,7 @@ Individual examples can also be build by calling `make` in their respective buil
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/trenchDeposition) focuses on a particle deposition process within a trench geometry. By default, the simulation presents a 2D representation of the trench. Nevertheless, users have the flexibility to conduct 3D simulations by adjusting the value of the constant _D_ in __trenchDeposition.cpp__ to 3. Customization of process and geometry parameters is achieved through the __config.txt__ file. The accompanying image illustrates instances of the trench deposition process, showcasing variations in the particle sticking probability _s_.
 
 <div align="center">
-  <img src="assets/deposition.svg" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/deposition.png" width=700 style="background-color:white;">
 </div>
 
 ### SF<sub>6</sub>/O<sub>2</sub> Hole Etching
@@ -208,7 +222,7 @@ The image presents the results of different flux configurations, as tested in _t
 > The images shown here were generated using **ViennaPS v3.6.0**.
 
 <div align="center">
-  <img src="assets/sf6o2_results.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/sf6o2_results.png" width=700 style="background-color:white;">
 </div>
 
 ### Bosch Process
@@ -222,7 +236,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/bosc
 This comparison highlights the trade-offs between computational efficiency and physical accuracy in DRIE simulations.
 
 <div align="center">
-  <img src="assets/bosch_process.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/bosch_process.png" width=700 style="background-color:white;">
 </div>
 
 ### Wet Etching
@@ -230,7 +244,7 @@ This comparison highlights the trade-offs between computational efficiency and p
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cantileverWetEtching) demonstrates the wet etching process, specifically focusing on the cantilever structure. The simulation captures the etching dynamics and the influence of crystallographic directions on the etch profile.
 
 <div align="center">
-  <img src="assets/wet_etching.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/wet_etching.png" width=700 style="background-color:white;">
 </div>
 
 ### Selective Epitaxy
@@ -238,7 +252,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cant
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/selectiveEpitaxy) demonstrates the selective epitaxy process, focusing on the growth of SiGe on a Si substrate. Similar to wet etching, the process is influenced by crystallographic directions, which can be adjusted in the __config.txt__ file. The simulation captures the growth dynamics and the resulting SiGe structure.
 
 <div align="center">
-  <img src="assets/epitaxy.png" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/epitaxy.png" width=700 style="background-color:white;">
 </div>
 
 ### Redeposition During Selective Etching
@@ -246,7 +260,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/sele
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/oxideRegrowth) demonstrates capturing etching byproducts and the subsequent redeposition during a selective etching process in a Si<sub>3</sub>N<sub>4</sub>/SiO<sub>2</sub> stack. The etching byproducts are captured in a cell set description of the etching plasma. To model the dynamics of these etching byproducts, a convection-diffusion equation is solved on the cell set using finite differences. The redeposition is then captured by adding up the byproducts in every step and using this information to generate a velocity field on the etched surface. 
 
 <div align="center">
-  <img src="assets/redeposition.gif" width=700 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/redeposition.gif" width=700 style="background-color:white;">
 </div>
 
 ### GDS Mask Import Example
@@ -254,7 +268,7 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/oxid
 This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/GDSReader) tests the full GDS mask import, blurring, rotation, scaling, and flipping as well as the level set conversion pipeline. Shown below is the result after applying proximity correction and extrusion on a simple test.
 
 <div align="center">
-  <img src="assets/masks.png" width=1200 style="background-color:white;">
+  <img src="https://raw.githubusercontent.com/ViennaTools/ViennaPS/master/assets/masks.png" width=1200 style="background-color:white;">
 </div>