ViennaPS 3.6.0__cp310-cp310-musllinux_1_1_x86_64.whl → 3.7.0__cp310-cp310-musllinux_1_1_x86_64.whl

{viennaps-3.6.0.dist-info → viennaps-3.7.0.dist-info}/METADATA

@@ -1,13 +1,8 @@
 Metadata-Version: 2.2
 Name: ViennaPS
-Version: 3.6.0
+Version: 3.7.0
 Summary: Semiconductor fabrication process simulation library
-License: Parts of the code (located in the 'external/' subfolder) have different
-         licenses. The individual licenses apply for this specific part. Please consult
-         the respective LICENSE files.
-         
-         
-         Copyright (c) 2015      Institute for Microelectronics, TU Wien.
+License: Copyright (c) 2025      Institute for Microelectronics, TU Wien.
          
          Permission is hereby granted, free of charge, to any person obtaining a copy
          of this software and associated documentation files (the "Software"), to deal
@@ -31,7 +26,7 @@ Project-URL: Homepage, https://viennatools.github.io/ViennaPS/
 Project-URL: Documentation, https://viennatools.github.io/ViennaPS/
 Project-URL: Repository, https://github.com/ViennaTools/ViennaPS
 Project-URL: Issues, https://github.com/ViennaTools/ViennaPS/issues
-Requires-Dist: ViennaLS>=4.4.0
+Requires-Dist: ViennaLS>=4.5.0
 Description-Content-Type: text/markdown
 
 <div align="center">
@@ -46,13 +41,10 @@ Description-Content-Type: text/markdown
 
 </div>
 
-ViennaPS is a header-only C++ library for simulating microelectronic fabrication processes. It combines surface and volume representations with advanced level-set methods and Monte Carlo flux calculations, powered by high-performance ray tracing. Users can develop custom models, use pre-configured physical models, or leverage emulation for flexible and efficient process simulations.
+ViennaPS is a header-only C++ library for simulating microelectronic fabrication processes. It combines surface and volume representations with advanced level-set methods and Monte Carlo flux calculations, powered by high-performance ray tracing. Users can develop custom models, use pre-configured physical models, or use fast emulation models for flexible and efficient process development.
 
 ViennaPS is designed to be easily integrated into existing C++ projects and provides Python bindings for seamless use in Python environments. The library is under active development and is continuously improved to meet the evolving needs of process simulation in microelectronics.
 
-> [!NOTE]  
-> ViennaPS is under heavy development and improved daily. If you do have suggestions or find bugs, please let us know!
-
 ## Quick Start  
 
 To install ViennaPS for Python, simply run:  
@@ -66,6 +58,10 @@ To use ViennaPS in C++, clone the repository and follow the installation steps b
 For full documentation, visit [ViennaPS Documentation](https://viennatools.github.io/ViennaPS/).
 
 ## Releases
+
+> [!NOTE]  
+> ViennaPS is under heavy development and improved daily. If you do have suggestions or find bugs, please let us know!
+
 Releases are tagged on the master branch and available in the [releases section](https://github.com/ViennaTools/ViennaPS/releases).
 
 ViennaPS is also available on the [Python Package Index (PyPI)](https://pypi.org/project/ViennaPS/) for most platforms.  
@@ -117,7 +113,7 @@ cmake -B build && cmake --build build
 cmake --install build --prefix "/path/to/your/custom/install/"
 ```
 
-This will install the necessary headers and CMake files to the specified path. If `--prefix` is not specified, it will be installed to the standard path for your system, usually `/usr/local/` . 
+This will install the necessary headers and CMake files to the specified path. If `--prefix` is not specified, it will be installed to the standard path for your system, usually `/usr/local/` on Linux-based systems.
 
 ## Building the Python package
 
@@ -130,7 +126,8 @@ cd ViennaPS
 pip install .
 ```
 
-> Some features of the ViennaPS Python module require the ViennaLS Python module. It is therefore recommended to additionally install the ViennaLS Python module on your system. Instructions to do so can be found in the [ViennaLS Git Repository](https://github.com/ViennaTools/viennals).
+> Some features of the ViennaPS Python module depend on the ViennaLS Python module. You’ll need to install ViennaLS separately — instructions are available in the [ViennaLS GitHub repository](https://github.com/ViennaTools/ViennaLS).
+> Note: A locally built ViennaPS Python module is typically not compatible with the ViennaLS package from PyPI. For details and troubleshooting, see [this guide](https://viennatools.github.io/ViennaPS/inst/troubleshooting.html#python-importerror).
 
 ## Using the Python package
 
@@ -151,7 +148,7 @@ We recommend using [CPM.cmake](https://github.com/cpm-cmake/CPM.cmake) to consum
 
 * Installation with CPM
   ```cmake
-  CPMAddPackage("gh:viennatools/viennaps@3.6.0")
+  CPMAddPackage("gh:viennatools/viennaps@3.7.0")
   ```
 
 * With a local installation
@@ -200,9 +197,9 @@ This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/tren
   <img src="assets/deposition.svg" width=700 style="background-color:white;">
 </div>
 
-### SF<sub>6</sub>O<sub>2</sub> Hole Etching
+### SF<sub>6</sub>/O<sub>2</sub> Hole Etching
 
-This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/holeEtching) demonstrates a hole etching process with a SF<sub>6</sub>O<sub>2</sub> plasma etching chemistry with ion bombardment. The process is controlled by various parameters, including geometry and plasma conditions, which can be adjusted in the __config.txt__ file.
+This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/holeEtching) demonstrates a hole etching process with a SF<sub>6</sub>/O<sub>2</sub> plasma etching chemistry with ion bombardment. The process is controlled by various parameters, including geometry and plasma conditions, which can be adjusted in the __config.txt__ file.
 
 The image presents the results of different flux configurations, as tested in _testFluxes.py_. Each structure represents a variation in flux conditions, leading to differences in hole shape, depth, and profile characteristics. The variations highlight the influence of ion and neutral fluxes on the etching process.
 
@@ -228,13 +225,20 @@ This comparison highlights the trade-offs between computational efficiency and p
   <img src="assets/bosch_process.png" width=700 style="background-color:white;">
 </div>
 
+### Wet Etching
+
+This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cantileverWetEtching) demonstrates the wet etching process, specifically focusing on the cantilever structure. The simulation captures the etching dynamics and the influence of crystallographic directions on the etch profile.
 
-### Anisotropic Processes
+<div align="center">
+  <img src="assets/wet_etching.png" width=700 style="background-color:white;">
+</div>
 
-In the anisotropic process model, the etch or deposition rates are dependent on the crystallographic directions of the surface. This enables the accurate modeling of intricate processes like [epitaxial growth](https://github.com/ViennaTools/ViennaPS/tree/master/examples/selectiveEpitaxy) or [anisotropic wet etching](https://github.com/ViennaTools/ViennaPS/tree/master/examples/cantileverWetEtching). Basic examples, illustrating these processes are provided with the library and shown below.
+### Selective Epitaxy
+
+This [example](https://github.com/ViennaTools/ViennaPS/tree/master/examples/selectiveEpitaxy) demonstrates the selective epitaxy process, focusing on the growth of SiGe on a Si substrate. Similar to wet etching, the process is influenced by crystallographic directions, which can be adjusted in the __config.txt__ file. The simulation captures the growth dynamics and the resulting SiGe structure.
 
 <div align="center">
-  <img src="assets/anisotropic_process.svg" width=700 style="background-color:white;">
+  <img src="assets/epitaxy.png" width=700 style="background-color:white;">
 </div>
 
 ### Redeposition During Selective Etching
@@ -287,6 +291,9 @@ Contact us via: viennatools@iue.tuwien.ac.at
 ViennaPS was developed under the aegis of the 'Institute for Microelectronics' at the 'TU Wien'.
 http://www.iue.tuwien.ac.at/
 
-License
---------------------------
-See file LICENSE in the base directory.
+## License
+
+ViennaPS is licensed under the [MIT License](./LICENSE).
+
+Some third-party libraries used by ViennaPS are under their own permissive licenses (MIT, BSD, Apache-2.0).  
+See [`THIRD_PARTY_LICENSES.md`](./THIRD_PARTY_LICENSES.md) for details.

{viennaps-3.6.0.dist-info → viennaps-3.7.0.dist-info}/RECORD

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{viennaps-3.6.0.dist-info → viennaps-3.7.0.dist-info}/licenses/LICENSE

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-Parts of the code (located in the 'external/' subfolder) have different
-licenses. The individual licenses apply for this specific part. Please consult
-the respective LICENSE files.
-
-
-Copyright (c) 2015      Institute for Microelectronics, TU Wien.
+Copyright (c) 2025      Institute for Microelectronics, TU Wien.
 
 Permission is hereby granted, free of charge, to any person obtaining a copy
 of this software and associated documentation files (the "Software"), to deal

viennaps.libs/cmake_install.cmake

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 endif()
 string(REGEX REPLACE "/$" "" CMAKE_INSTALL_PREFIX "${CMAKE_INSTALL_PREFIX}")
 

viennaps.libs/tests/cmake_install.cmake

@@ -2,7 +2,7 @@
 
 # Set the install prefix
 if(NOT DEFINED CMAKE_INSTALL_PREFIX)
-  set(CMAKE_INSTALL_PREFIX "/tmp/tmpjmd9t3ci/wheel/platlib")
+  set(CMAKE_INSTALL_PREFIX "/tmp/tmps7bovhdg/wheel/platlib")
 endif()
 string(REGEX REPLACE "/$" "" CMAKE_INSTALL_PREFIX "${CMAKE_INSTALL_PREFIX}")
 

viennaps2d/viennaps2d.pyi

@@ -22,23 +22,8 @@ class AdvectionParameters:
     timeStepRatio: float
     velocityOutput: bool
     def __init__(self) -> None: ...
-
-class AnisotropicProcess(ProcessModel):
-    @overload
-    def __init__(
-        self, materials: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]]
-    ) -> None: ...
-    @overload
-    def __init__(
-        self,
-        direction100,
-        direction010,
-        rate100: typing.SupportsFloat,
-        rate110: typing.SupportsFloat,
-        rate111: typing.SupportsFloat,
-        rate311: typing.SupportsFloat,
-        materials: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
-    ) -> None: ...
+    def toMetaData(self) -> dict[str, list[float]]: ...
+    def toMetaDataString(self) -> str: ...
 
 class AtomicLayerProcess:
     def __init__(self) -> None: ...
@@ -321,7 +306,7 @@ class Domain:
         material: Material,
         wrapLowerLevelSet: bool = ...,
     ) -> None: ...
-    def print(self, arg0, arg1: bool) -> None: ...
+    def print(self, hrleInfo: bool = ...) -> None: ...
     def removeLevelSet(self, arg0: typing.SupportsInt, arg1: bool) -> None: ...
     def removeMaterial(self, arg0: Material) -> None: ...
     def removeTopLevelSet(self) -> None: ...
@@ -375,7 +360,7 @@ class Domain3D:
     def getSetup(self, *args, **kwargs): ...
     def insertNextLevelSet(self, *args, **kwargs): ...
     def insertNextLevelSetAsMaterial(self, *args, **kwargs): ...
-    def print(self, arg0, arg1: bool) -> None: ...
+    def print(self, hrleInfo: bool = ...) -> None: ...
     def removeLevelSet(self, arg0: typing.SupportsInt, arg1: bool) -> None: ...
     def removeMaterial(self, arg0: Material) -> None: ...
     def removeTopLevelSet(self) -> None: ...
@@ -637,9 +622,9 @@ class HBrO2Etching(ProcessModel):
 
 class HoleShape:
     __members__: ClassVar[dict] = ...  # read-only
-    Full: ClassVar[HoleShape] = ...
-    Half: ClassVar[HoleShape] = ...
-    Quarter: ClassVar[HoleShape] = ...
+    FULL: ClassVar[HoleShape] = ...
+    HALF: ClassVar[HoleShape] = ...
+    QUARTER: ClassVar[HoleShape] = ...
     __entries: ClassVar[dict] = ...
     def __init__(self, value: typing.SupportsInt) -> None: ...
     def __eq__(self, other: object) -> bool: ...
@@ -765,11 +750,17 @@ class Logger:
     ) -> Logger: ...
     def addWarning(self, arg0: str) -> Logger: ...
     @staticmethod
+    def appendToLogFile(arg0: str) -> bool: ...
+    @staticmethod
+    def closeLogFile() -> None: ...
+    @staticmethod
     def getInstance() -> Logger: ...
     @staticmethod
     def getLogLevel() -> int: ...
     def print(self) -> None: ...
     @staticmethod
+    def setLogFile(arg0: str) -> bool: ...
+    @staticmethod
     def setLogLevel(arg0: LogLevel) -> None: ...
 
 class MakeFin:
@@ -972,8 +963,8 @@ class MaterialMap:
 
 class MetaDataLevel:
     __members__: ClassVar[dict] = ...  # read-only
-    DOMAIN: ClassVar[MetaDataLevel] = ...
     FULL: ClassVar[MetaDataLevel] = ...
+    GRID: ClassVar[MetaDataLevel] = ...
     NONE: ClassVar[MetaDataLevel] = ...
     PROCESS: ClassVar[MetaDataLevel] = ...
     __entries: ClassVar[dict] = ...
@@ -1238,13 +1229,15 @@ class RayTracingParameters:
     sourceDirection: Incomplete
     useRandomSeeds: bool
     def __init__(self) -> None: ...
+    def toMetaData(self) -> dict[str, list[float]]: ...
+    def toMetaDataString(self) -> str: ...
 
 class Reader:
     @overload
     def __init__(self) -> None: ...
     @overload
     def __init__(self, fileName: str) -> None: ...
-    def apply(self) -> Domain: ...
+    def apply(self) -> None: ...
     def setFileName(self, arg0: str) -> None: ...
 
 class SF6C4F8Etching(ProcessModel):
@@ -1289,6 +1282,14 @@ class SF6O2Etching(ProcessModel):
     def getParameters(self) -> PlasmaEtchingParameters: ...
     def setParameters(self, arg0: PlasmaEtchingParameters) -> None: ...
 
+class SelectiveEpitaxy(ProcessModel):
+    def __init__(
+        self,
+        materialRates: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
+        rate111: typing.SupportsFloat = ...,
+        rate100: typing.SupportsFloat = ...,
+    ) -> None: ...
+
 class SingleParticleALD(ProcessModel):
     def __init__(
         self,
@@ -1341,6 +1342,11 @@ class SphereDistribution(ProcessModel):
         self, radius: typing.SupportsFloat, gridDelta: typing.SupportsFloat
     ) -> None: ...
 
+class StencilLocalLaxFriedrichsScalar:
+    def __init__(self, *args, **kwargs) -> None: ...
+    @staticmethod
+    def setMaxDissipation(maxDissipation: typing.SupportsFloat) -> None: ...
+
 class TEOSDeposition(ProcessModel):
     def __init__(
         self,
@@ -1385,6 +1391,24 @@ class ToDiskMesh:
     def setDomain(self, arg0: Domain) -> None: ...
     def setMesh(self, arg0: viennals2d.viennals2d.Mesh) -> None: ...
 
+class WetEtching(ProcessModel):
+    @overload
+    def __init__(
+        self,
+        materialRates: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
+    ) -> None: ...
+    @overload
+    def __init__(
+        self,
+        direction100,
+        direction010,
+        rate100: typing.SupportsFloat,
+        rate110: typing.SupportsFloat,
+        rate111: typing.SupportsFloat,
+        rate311: typing.SupportsFloat,
+        materialRates: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
+    ) -> None: ...
+
 class Writer:
     @overload
     def __init__(self) -> None: ...

viennaps3d/viennaps3d.pyi

@@ -22,23 +22,8 @@ class AdvectionParameters:
     timeStepRatio: float
     velocityOutput: bool
     def __init__(self) -> None: ...
-
-class AnisotropicProcess(ProcessModel):
-    @overload
-    def __init__(
-        self, materials: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]]
-    ) -> None: ...
-    @overload
-    def __init__(
-        self,
-        direction100,
-        direction010,
-        rate100: typing.SupportsFloat,
-        rate110: typing.SupportsFloat,
-        rate111: typing.SupportsFloat,
-        rate311: typing.SupportsFloat,
-        materials: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
-    ) -> None: ...
+    def toMetaData(self) -> dict[str, list[float]]: ...
+    def toMetaDataString(self) -> str: ...
 
 class AtomicLayerProcess:
     def __init__(self) -> None: ...
@@ -314,7 +299,7 @@ class Domain:
         material: Material,
         wrapLowerLevelSet: bool = ...,
     ) -> None: ...
-    def print(self, arg0, arg1: bool) -> None: ...
+    def print(self, hrleInfo: bool = ...) -> None: ...
     def removeLevelSet(self, arg0: typing.SupportsInt, arg1: bool) -> None: ...
     def removeMaterial(self, arg0: Material) -> None: ...
     def removeTopLevelSet(self) -> None: ...
@@ -562,9 +547,9 @@ class HBrO2Etching(ProcessModel):
 
 class HoleShape:
     __members__: ClassVar[dict] = ...  # read-only
-    Full: ClassVar[HoleShape] = ...
-    Half: ClassVar[HoleShape] = ...
-    Quarter: ClassVar[HoleShape] = ...
+    FULL: ClassVar[HoleShape] = ...
+    HALF: ClassVar[HoleShape] = ...
+    QUARTER: ClassVar[HoleShape] = ...
     __entries: ClassVar[dict] = ...
     def __init__(self, value: typing.SupportsInt) -> None: ...
     def __eq__(self, other: object) -> bool: ...
@@ -690,11 +675,17 @@ class Logger:
     ) -> Logger: ...
     def addWarning(self, arg0: str) -> Logger: ...
     @staticmethod
+    def appendToLogFile(arg0: str) -> bool: ...
+    @staticmethod
+    def closeLogFile() -> None: ...
+    @staticmethod
     def getInstance() -> Logger: ...
     @staticmethod
     def getLogLevel() -> int: ...
     def print(self) -> None: ...
     @staticmethod
+    def setLogFile(arg0: str) -> bool: ...
+    @staticmethod
     def setLogLevel(arg0: LogLevel) -> None: ...
 
 class MakeFin:
@@ -897,8 +888,8 @@ class MaterialMap:
 
 class MetaDataLevel:
     __members__: ClassVar[dict] = ...  # read-only
-    DOMAIN: ClassVar[MetaDataLevel] = ...
     FULL: ClassVar[MetaDataLevel] = ...
+    GRID: ClassVar[MetaDataLevel] = ...
     NONE: ClassVar[MetaDataLevel] = ...
     PROCESS: ClassVar[MetaDataLevel] = ...
     __entries: ClassVar[dict] = ...
@@ -1163,13 +1154,15 @@ class RayTracingParameters:
     sourceDirection: Incomplete
     useRandomSeeds: bool
     def __init__(self) -> None: ...
+    def toMetaData(self) -> dict[str, list[float]]: ...
+    def toMetaDataString(self) -> str: ...
 
 class Reader:
     @overload
     def __init__(self) -> None: ...
     @overload
     def __init__(self, fileName: str) -> None: ...
-    def apply(self) -> Domain: ...
+    def apply(self) -> None: ...
     def setFileName(self, arg0: str) -> None: ...
 
 class SF6C4F8Etching(ProcessModel):
@@ -1214,6 +1207,14 @@ class SF6O2Etching(ProcessModel):
     def getParameters(self) -> PlasmaEtchingParameters: ...
     def setParameters(self, arg0: PlasmaEtchingParameters) -> None: ...
 
+class SelectiveEpitaxy(ProcessModel):
+    def __init__(
+        self,
+        materialRates: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
+        rate111: typing.SupportsFloat = ...,
+        rate100: typing.SupportsFloat = ...,
+    ) -> None: ...
+
 class SingleParticleALD(ProcessModel):
     def __init__(
         self,
@@ -1266,6 +1267,11 @@ class SphereDistribution(ProcessModel):
         self, radius: typing.SupportsFloat, gridDelta: typing.SupportsFloat
     ) -> None: ...
 
+class StencilLocalLaxFriedrichsScalar:
+    def __init__(self, *args, **kwargs) -> None: ...
+    @staticmethod
+    def setMaxDissipation(maxDissipation: typing.SupportsFloat) -> None: ...
+
 class TEOSDeposition(ProcessModel):
     def __init__(
         self,
@@ -1310,6 +1316,24 @@ class ToDiskMesh:
     def setDomain(self, arg0: Domain) -> None: ...
     def setMesh(self, arg0: viennals3d.viennals3d.Mesh) -> None: ...
 
+class WetEtching(ProcessModel):
+    @overload
+    def __init__(
+        self,
+        materialRates: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
+    ) -> None: ...
+    @overload
+    def __init__(
+        self,
+        direction100,
+        direction010,
+        rate100: typing.SupportsFloat,
+        rate110: typing.SupportsFloat,
+        rate111: typing.SupportsFloat,
+        rate311: typing.SupportsFloat,
+        materialRates: collections.abc.Sequence[tuple[Material, typing.SupportsFloat]],
+    ) -> None: ...
+
 class Writer:
     @overload
     def __init__(self) -> None: ...